- 专利标题: Semiconductor chip with coil element over passivation layer
-
申请号: US13159147申请日: 2011-06-13
-
公开(公告)号: US08362588B2公开(公告)日: 2013-01-29
- 发明人: Wen-Chieh Lee , Mou-Shiung Lin , Chien-Kang Chou , Yi-Cheng Liu , Chiu-Ming Chou , Jin-Yuan Lee
- 申请人: Wen-Chieh Lee , Mou-Shiung Lin , Chien-Kang Chou , Yi-Cheng Liu , Chiu-Ming Chou , Jin-Yuan Lee
- 申请人地址: TW Hsinchu
- 专利权人: Megica Corporation
- 当前专利权人: Megica Corporation
- 当前专利权人地址: TW Hsinchu
- 代理机构: McDermott Will & Emery LLP
- 主分类号: H01L29/00
- IPC分类号: H01L29/00 ; H01L23/52 ; H01L23/48
摘要:
A method for fabricating a circuitry component includes providing a semiconductor substrate, a first coil over said semiconductor substrate, a passivation layer over said first coil; and depositing a second coil over said passivation layer and over said first coil. Said second coil may be deposited by forming a first metal layer over said passivation layer, forming a pattern defining layer over said first metal layer, a first opening in said pattern defining layer exposing said first metal layer, forming a second metal layer over said first metal layer exposed by said first opening, removing said pattern defining layer, and removing said first metal layer not under said second metal layer.
公开/授权文献
信息查询
IPC分类: