发明授权
- 专利标题： Pattern dimension calculation method and computer program product
- 专利标题（中）： 图案尺寸计算方法和计算机程序产品
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申请号： US13050864申请日： 2011-03-17
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公开(公告)号： US08336005B2公开(公告)日： 2012-12-18
- 发明人: Takafumi Taguchi , Toshiya Kotani , Hiromitsu Mashita , Fumiharu Nakajima , Ryota Aburada , Chikaaki Kodama
- 申请人： Takafumi Taguchi , Toshiya Kotani , Hiromitsu Mashita , Fumiharu Nakajima , Ryota Aburada , Chikaaki Kodama
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2010-134655 20100614
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A pattern dimension calculation method according to one embodiment calculates a taper shape of a mask member used as a mask when a circuit pattern is processed in an upper layer of the circuit pattern formed on a substrate. The method calculates an opening angle facing the mask member from a shape prediction position on the circuit pattern on the basis of the taper shape. The method calculates a dimension of the circuit pattern according to the opening angle formed at the shape prediction position.
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