Invention Grant
US08318534B2 Non-volatile resistive-switching memories formed using anodization
有权
使用阳极氧化形成的非易失性电阻式开关存储器
- Patent Title: Non-volatile resistive-switching memories formed using anodization
- Patent Title (中): 使用阳极氧化形成的非易失性电阻式开关存储器
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Application No.: US13098632Application Date: 2011-05-02
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Publication No.: US08318534B2Publication Date: 2012-11-27
- Inventor: Alexander Gorer , Prashant Phatak , Tony Chiang , Igor Ivanov
- Applicant: Alexander Gorer , Prashant Phatak , Tony Chiang , Igor Ivanov
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Non-volatile resistive-switching memories formed using anodization are described. A method for forming a resistive-switching memory element using anodization includes forming a metal containing layer, anodizing the metal containing layer at least partially to form a resistive switching metal oxide, and forming a first electrode over the resistive switching metal oxide. In some examples, an unanodized portion of the metal containing layer may be a second electrode of the memory element.
Public/Granted literature
- US20110204311A1 NON-VOLATILE RESISTIVE-SWITCHING MEMORIES FORMED USING ANODIZATION Public/Granted day:2011-08-25
Information query
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