发明授权
- 专利标题: Power device structures and methods
- 专利标题(中): 功率器件结构和方法
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申请号: US12626523申请日: 2009-11-25
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公开(公告)号: US08304329B2公开(公告)日: 2012-11-06
- 发明人: Jun Zeng , Mohamed N. Darwish
- 申请人: Jun Zeng , Mohamed N. Darwish
- 申请人地址: US CA Santa Clara
- 专利权人: MaxPower Semiconductor, Inc.
- 当前专利权人: MaxPower Semiconductor, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理商 Robert O. Groover, III
- 主分类号: H01L29/78
- IPC分类号: H01L29/78
摘要:
Vertical power devices which include an insulated trench containing insulating material and a gate electrode, and related methods. A body region is positioned so that a voltage bias on the gate electrode will cause an inversion layer in the body region. A layer of permanent charge, at or near the sidewall of the trench, provides charge balancing for the space charge in the depleted semiconductor material during the OFF state. A conductive shield layer is positioned below the gate electrode in the insulating material, and reduces capacitive coupling between the gate and the lower part of the trench. This reduces switching losses. In other embodiments, a planar gate electrode controls horizontal carrier injection into the vertical conduction pathway along the trench, while a shield plate lies over the trench itself to reduce capacitive coupling.
公开/授权文献
- US20100219468A1 POWER DEVICE STRUCTURES AND METHODS 公开/授权日:2010-09-02
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