发明授权
- 专利标题： Sample processing and observing method
- 专利标题（中）： 样品处理和观察方法
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申请号： US13065238申请日： 2011-03-17
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公开(公告)号： US08274049B2公开(公告)日： 2012-09-25
- 发明人: Keiichi Tanaka , Yo Yamamoto , Xin Man , Junichi Tashiro , Toshiaki Fujii
- 申请人： Keiichi Tanaka , Yo Yamamoto , Xin Man , Junichi Tashiro , Toshiaki Fujii
- 申请人地址： JP
- 专利权人： SII NanoTechnology Inc.
- 当前专利权人： SII NanoTechnology Inc.
- 当前专利权人地址： JP
- 代理机构： Adams & Wilks
- 优先权： JP2010-063337 20100318
- 主分类号： H01L21/66
- IPC分类号： H01L21/66
摘要：
There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.
公开/授权文献
- US20110226948A1 Sample processing and observing method 公开/授权日：2011-09-22
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