发明授权
- 专利标题: Electrostatic discharge protection element and electrostatic discharge protection chip and method of producing the same
- 专利标题(中): 静电放电保护元件及静电放电保护芯片及其制造方法
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申请号: US12533919申请日: 2009-07-31
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公开(公告)号: US08270131B2公开(公告)日: 2012-09-18
- 发明人: Wolfgang Klein , Hans Taddiken , Winfried Bakalski
- 申请人: Wolfgang Klein , Hans Taddiken , Winfried Bakalski
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 代理机构: Slater & Matsil, L.L.P.
- 主分类号: H02H9/00
- IPC分类号: H02H9/00
摘要:
An electrostatic discharge (ESD) protection element is described, the ESD protection element including a collector area, a first barrier area, a semiconductor area, a second barrier area and an emitter area. The collector area has a first conductivity type. The first barrier area borders on the collector area and has a second conductivity type. The semiconductor area borders on the first barrier area and is an intrinsic semiconductor area, or has the first or second conductivity type and a dopant concentration which is lower than a dopant concentration of the first barrier area. The second barrier area borders on the semiconductor area and has the second conductivity type and a higher dopant concentration than the semiconductor area. The emitter area borders on the second barrier area and has the first conductivity type.
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