发明授权
US08269944B2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
有权
在浸没式光刻机中的晶片更换期间,将投影透镜下方的间隙中的浸没流体保持在装置和方法
- 专利标题: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
- 专利标题(中): 在浸没式光刻机中的晶片更换期间,将投影透镜下方的间隙中的浸没流体保持在装置和方法
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申请号: US11882837申请日: 2007-08-06
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公开(公告)号: US08269944B2公开(公告)日: 2012-09-18
- 发明人: Michael Binnard
- 申请人: Michael Binnard
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 主分类号: G03B27/32
- IPC分类号: G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/58
摘要:
A liquid immersion exposure apparatus in which a substrate is exposed to an exposure beam, includes an optical member through which the substrate is exposed to the exposure beam, a cover member having a surface, a first holding system that detachably holds the cover member, and a second holding system that holds the cover member which is released from the first holding system. The surface of the cover member held by the second holding system is opposite to the optical member.
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