Invention Grant
- Patent Title: Method of manufacturing a light emitting diode element
- Patent Title (中): 制造发光二极管元件的方法
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Application No.: US12648308Application Date: 2009-12-29
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Publication No.: US08173456B2Publication Date: 2012-05-08
- Inventor: Jenq-Dar Tsay , Suh-Fang Lin , Yu-Hsiang Chang , Yih-Der Guo , Sheng-Huei Kuo , Wei-Hung Kuo , Hsun-Chih Liu
- Applicant: Jenq-Dar Tsay , Suh-Fang Lin , Yu-Hsiang Chang , Yih-Der Guo , Sheng-Huei Kuo , Wei-Hung Kuo , Hsun-Chih Liu
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of manufacturing a light emitting diode element is provided. A first patterned semi-conductor layer, a patterned light emitting layer, and a second patterned semi-conductor layer are sequentially formed on an epitaxy substrate so as to form a plurality of epitaxy structures, wherein the first patterned semi-conductor layer has a thinner portion in a non-epitaxy area outside the epitaxy structures. A passivation layer covering the epitaxy structures and the thinner portion is formed. The passivation layer covering on the thinner portion is partially removed to form a patterned passivation layer. A patterned reflector is formed directly on each of the epitaxy structures. The epitaxy structures are bonded to a carrier substrate. A lift-off process is performed to separate the epitaxy structures from the epitaxy substrate. An electrode is formed on each of the epitaxy structures far from the patterned reflector.
Public/Granted literature
- US20110003410A1 METHOD OF MANUFACTURING A LIGHT EMITTING DIODE ELEMENT Public/Granted day:2011-01-06
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