Invention Grant
- Patent Title: Ion beam angle calibration and emittance measurement system for ribbon beams
- Patent Title (中): 离子束角度校准和光束辐射测量系统
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Application No.: US12357688Application Date: 2009-01-22
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Publication No.: US08168941B2Publication Date: 2012-05-01
- Inventor: Marvin Farley , Donald Polner , Geoffrey Ryding , Theodore Smick , Takao Sakase , Ronald Horner , Edward Eisner , Paul Eide , Brian Freer , Mark Lambert , Donovan Beckel
- Applicant: Marvin Farley , Donald Polner , Geoffrey Ryding , Theodore Smick , Takao Sakase , Ronald Horner , Edward Eisner , Paul Eide , Brian Freer , Mark Lambert , Donovan Beckel
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J3/00
- IPC: H01J3/00 ; G01N27/62

Abstract:
An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.
Public/Granted literature
- US20100181470A1 ION BEAM ANGLE CALIBRATION AND EMITTANCE MEASUREMENT SYSTEM FOR RIBBON BEAMS Public/Granted day:2010-07-22
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