发明授权
- 专利标题: Reducing drift in chalcogenide devices
- 专利标题(中): 减少硫族化物装置中的漂移
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申请号: US13072002申请日: 2011-03-25
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公开(公告)号: US08164949B2公开(公告)日: 2012-04-24
- 发明人: Semyon D. Savransky
- 申请人: Semyon D. Savransky
- 申请人地址: US MI Troy
- 专利权人: Ovonyx, Inc.
- 当前专利权人: Ovonyx, Inc.
- 当前专利权人地址: US MI Troy
- 代理机构: Trop, Pruner & Hu, P.C.
- 主分类号: G11C11/00
- IPC分类号: G11C11/00 ; H01L47/00
摘要:
Chalcogenide materials conventionally used in chalcogenide memory devices and ovonic threshold switches may exhibit a tendency called drift, wherein threshold voltage or resistance changes with time. By providing a compensating material which exhibits an opposing tendency, the drift may be compensated. The compensating material may be mixed into a chalcogenide, may be layered with chalcogenide, may be provided with a heater, or may be provided as part of an electrode in some embodiments. Both chalcogenide and non-chalcogenide compensating materials may be used.
公开/授权文献
- US20110168965A1 Reducing Drift in Chalcogenide Devices 公开/授权日:2011-07-14
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