发明授权
- 专利标题: High resolution wide angle tomographic probe
- 专利标题(中): 高分辨率广角断层摄影探头
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申请号: US12682700申请日: 2008-10-08
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公开(公告)号: US08074292B2公开(公告)日: 2011-12-06
- 发明人: Alain Bostel , Mikhail Yavor , Ludovic Renaud , Bernard Deconihout
- 申请人: Alain Bostel , Mikhail Yavor , Ludovic Renaud , Bernard Deconihout
- 申请人地址: FR
- 专利权人: Cameca
- 当前专利权人: Cameca
- 当前专利权人地址: FR
- 代理机构: Baker & Hostetler, LLP
- 优先权: FR0707178 20071012
- 国际申请: PCT/EP2008/063462 WO 20081008
- 国际公布: WO2009/047265 WO 20090416
- 主分类号: G01Q60/00
- IPC分类号: G01Q60/00
摘要:
The present invention concerns the enhancing of the mass resolution of wide angle tomographic atom probes. The invention consists of an atom probe also comprising a sample-holding device and a detector which are separated from one another by a distance L and enclosed in a chamber, an “Einzel” type electrostatic lens consisting of three electrodes arranged inside the chamber between the sample and the detector, to which electrical potentials are applied so as to form an electrical field that strongly focuses the beam of ions emitted by the sample under test when the probe is operating. According to the invention, the geometry of the electrodes is defined precisely so as to greatly limit the effects of the spherical aberration that affects the “Einzel” lens on the beam of ions, said spherical aberration being clearly sensitive when the lens is greatly polarized. The invention applies more particularly to the atom probes known as 3D atom probes.
公开/授权文献
- US20100223698A1 High Resolution Wide Angle Tomographic Probe 公开/授权日:2010-09-02
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