发明授权
- 专利标题： Cleaning formulation for removing residues on surfaces
- 专利标题（中）： 用于清除表面残留物的清洁配方
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申请号： US11770382申请日： 2007-06-28
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公开(公告)号： US07947637B2公开(公告)日： 2011-05-24
- 发明人: Emil Kneer
- 申请人： Emil Kneer
- 申请人地址： US RI North Kingstown
- 专利权人： Fujifilm Electronic Materials, U.S.A., Inc.
- 当前专利权人： Fujifilm Electronic Materials, U.S.A., Inc.
- 当前专利权人地址： US RI North Kingstown
- 代理机构： Fish & Richardson P.C.
- 主分类号： C11D7/50
- IPC分类号： C11D7/50
摘要：
The present disclosure provides a non-corrosive cleaning composition that is useful for removing residues from a semiconductor substrate. The composition can comprise water, at least one hydrazinocarboxylic acid ester, at least one water soluble carboxylic acid, optionally, at least one fluoride-containing compound, and, optionally, at least one corrosion inhibitor not containing a carboxyl group. The present disclosure also provides a method of cleaning residues from a semiconductor substrate using the non-corrosive cleaning composition.
公开/授权文献
- US20080004197A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES 公开/授权日：2008-01-03
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