发明授权
- 专利标题: Unified layer stack architecture
- 专利标题(中): 统一层堆栈架构
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申请号: US12109501申请日: 2008-04-25
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公开(公告)号: US07853901B2公开(公告)日: 2010-12-14
- 发明人: Viswanathan Lakshmanan , Thomas R. O'Brien , Richard D. Blinne
- 申请人: Viswanathan Lakshmanan , Thomas R. O'Brien , Richard D. Blinne
- 申请人地址: US CA Milpitas
- 专利权人: LSI Corporation
- 当前专利权人: LSI Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Luedeka, Neely & Graham, P.C.
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A method for producing a family of digital integrated circuit designs, where the family has a highest level design and at least one lower level design. The highest level design is first produced. Then, in a programmed computing system without user intervention, the highest level design is automatically processed to selectively remove at least one predetermined metal layer. A closest remaining overlying layer to the at least one removed metal layer is automatically mapped to a closest remaining underlying layer to the at least one removed metal layer, thereby producing the at least one lower level design.
公开/授权文献
- US20090271755A1 Unified Layer Stack Architecture 公开/授权日:2009-10-29
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