发明授权
US07767596B2 Wafer support pin for preventing slip dislocation during annealing of water and wafer annealing method using the same
有权
用于防止水退火期间的滑脱错位的晶片支撑销和使用其的晶片退火方法
- 专利标题： Wafer support pin for preventing slip dislocation during annealing of water and wafer annealing method using the same
- 专利标题（中）： 用于防止水退火期间的滑脱错位的晶片支撑销和使用其的晶片退火方法
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申请号： US12005415申请日： 2007-12-26
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公开(公告)号： US07767596B2公开(公告)日： 2010-08-03
- 发明人: Kun Kim , Jin-Kyun Hong , Woo-Hyun Seo , Kyoung-Hwan Song
- 申请人： Kun Kim , Jin-Kyun Hong , Woo-Hyun Seo , Kyoung-Hwan Song
- 申请人地址： KR Gumi
- 专利权人： Siltron, Inc.
- 当前专利权人： Siltron, Inc.
- 当前专利权人地址： KR Gumi
- 代理机构： Greer, Burns & Crain, Ltd
- 优先权： KR10-2006-0134791 20061227
- 主分类号： H01L21/26
- IPC分类号： H01L21/26
摘要：
A wafer support pin has a front end contacted with a wafer such that the front end is flat or rounded. Thus, gravitational stress is minimized during annealing the wafer, thereby minimizing slip dislocation. This wafer support pin is suitably used for annealing of a wafer, particularly high temperature rapid thermal annealing of a large-diameter wafer.
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