发明授权
- 专利标题: Semiconductor apparatus having improved thermal fatigue life
- 专利标题(中): 具有改善的热疲劳寿命的半导体装置
-
申请号: US11834734申请日: 2007-08-07
-
公开(公告)号: US07692299B2公开(公告)日: 2010-04-06
- 发明人: Chikara Nakajima , Takeshi Kurosawa , Megumi Mizuno
- 申请人: Chikara Nakajima , Takeshi Kurosawa , Megumi Mizuno
- 申请人地址: JP JP
- 专利权人: Hitachi Haramachi Electronics Co., Ltd.,Hitachi, Ltd.
- 当前专利权人: Hitachi Haramachi Electronics Co., Ltd.,Hitachi, Ltd.
- 当前专利权人地址: JP JP
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2006-217207 20060809
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L23/02 ; H01L23/049 ; H01L23/28 ; H01L23/31
摘要:
A semiconductor apparatus having improved thermal fatigue life is provided by lowering maximum temperature on jointing members and reducing temperature change. A jointing member is placed between a semiconductor chip and a lead electrode, and a thermal stress relaxation body is arranged between the chip and a support electrode. Jointing members are placed between the thermal stress relaxation body and the chip and between the thermal stress relaxation body and the support electrode. A second thermal stress relaxation body made from a material having a thermal expansion coefficient between the coefficients of the chip and the lead electrode is located between the chip and the lead electrode. The first thermal stress relaxation body is made from a material which has a thermal expansion coefficient in between the coefficients of the chip and the support electrode, and has a thermal conductivity of 50 to 300 W/(m·° C.).
公开/授权文献
- US20080036088A1 SEMICONDUCTOR APPARATUS 公开/授权日:2008-02-14
信息查询
IPC分类: