发明授权
US07674352B2 System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus
失效
使用喷头装置将气态混合物沉积到基材表面上的系统和方法
- 专利标题： System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus
- 专利标题（中）： 使用喷头装置将气态混合物沉积到基材表面上的系统和方法
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申请号： US11564198申请日： 2006-11-28
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公开(公告)号： US07674352B2公开(公告)日： 2010-03-09
- 发明人: David Bour , Lori Washington , Sandeep Nijhawan , Ronald Stevens , Jacob Smith , Alexander Tam , Nyi Oo Myo , Steve Park , Rosemary Twist , Garry Kwong , Jie Su
- 申请人： David Bour , Lori Washington , Sandeep Nijhawan , Ronald Stevens , Jacob Smith , Alexander Tam , Nyi Oo Myo , Steve Park , Rosemary Twist , Garry Kwong , Jie Su
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Townsend and Townsend and Crew, LLP
- 主分类号： C23F1/00
- IPC分类号： C23F1/00 ; H01L21/306
摘要：
A gaseous mixture is deposited onto a substrate surface using a showerhead. A first plenum of the showerhead has a plurality of channels fluidicly coupled with an interior of a processing chamber. A second plenum gas flows through a plurality of tubes extending from a second plenum of the showerhead through the channels into the interior of the processing chamber. The diameter of the tubes is smaller than the diameter of the channels such that a first plenum gas flows into the interior of the processing chamber through a space defined between the outer surface of the tubes and the surface of the channels. The length and diameter of the tubes determine the level of distribution and the molar ratio of the first gas and the second gas in the gaseous mixture that is deposited on the surface of the substrate.
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