发明授权
- 专利标题: Semiconductor integrated circuit and method for manufacturing the same
- 专利标题(中): 半导体集成电路及其制造方法
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申请号: US11976963申请日: 2007-10-30
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公开(公告)号: US07667316B2公开(公告)日: 2010-02-23
- 发明人: Shingo Fukamizu , Yutaka Nabeshima , Takashi Katsuyama
- 申请人: Shingo Fukamizu , Yutaka Nabeshima , Takashi Katsuyama
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2006-295689 20061031; JP2006-325465 20061201
- 主分类号: H01L23/49
- IPC分类号: H01L23/49 ; H01L21/44
摘要:
A semiconductor integrated circuit includes a power transistor formed on a semiconductor substrate, a plurality of first metal patterns and a plurality of second metal patterns which are formed right above the power transistor and function as a first electrode and as a second electrode of the power transistor, respectively, a plurality of first buses each electrically connected with, of a plurality of first metal patterns, a corresponding first metal pattern, a plurality of second buses each electrically connected with, of a plurality of second metal patterns, a corresponding second metal pattern, wherein one contact pad is provided to each of a plurality of first buses and a plurality of second buses.
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