发明授权
- 专利标题： Precursor compositions and methods for the deposition of passive electrical components on a substrate
- 专利标题（中）： 用于将无源电组件沉积在衬底上的前体组合物和方法
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申请号： US10265070申请日： 2002-10-04
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公开(公告)号： US07524528B2公开(公告)日： 2009-04-28
- 发明人: Toivo T. Kodas , Mark J. Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron D. Stump , Allen B. Schult , Paolina Atanassova , Klaus Kunze
- 申请人： Toivo T. Kodas , Mark J. Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron D. Stump , Allen B. Schult , Paolina Atanassova , Klaus Kunze
- 申请人地址： US MA Boston
- 专利权人： Cabot Corporation
- 当前专利权人： Cabot Corporation
- 当前专利权人地址： US MA Boston
- 代理机构： Marsh Fischmann & Breyfogle LLP
- 主分类号： B05D5/12
- IPC分类号： B05D5/12 ; B05D3/00 ; H01C17/28
摘要：
Precursor compositions for the deposition of electronic features such as resistors and dielectric components and methods for the deposition of the precursor compositions. The precursor compositions have a low viscosity, such as not greater than about 1000 centipoise and can be deposited using a direct-write tool. The precursors also have a low conversion temperature, enabling the formation of electronic features on a wide variety of substrates, including low temperature substrates.
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