发明授权
- 专利标题： Photosensitive composition and use thereof
- 专利标题（中）： 感光组合物及其用途
-
申请号： US10376356申请日： 2003-02-27
-
公开(公告)号： US07078157B2公开(公告)日： 2006-07-18
- 发明人: Hong Zhuang , Joseph E. Oberlander , Ping-Hung Lu , Stanely F. Wanat , Robert R. Plass
- 申请人： Hong Zhuang , Joseph E. Oberlander , Ping-Hung Lu , Stanely F. Wanat , Robert R. Plass
- 申请人地址： US NJ Somerville
- 专利权人： AZ Electronic Materials USA Corp.
- 当前专利权人： AZ Electronic Materials USA Corp.
- 当前专利权人地址： US NJ Somerville
- 代理商 Alan P. Kass
- 主分类号： G03C1/73
- IPC分类号： G03C1/73 ; G03F7/028 ; G03F7/20 ; G03F7/30 ; G03F7/42
摘要：
A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.
公开/授权文献
- US20040175653A1 Photosensitive composition and use thereof 公开/授权日：2004-09-09
信息查询
