Invention Grant
- Patent Title: Suspended gate single-electron device
- Patent Title (中): 悬挂式单电子器件
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Application No.: US10982730Application Date: 2004-11-03
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Publication No.: US07018881B2Publication Date: 2006-03-28
- Inventor: Christoph Wasshuber
- Applicant: Christoph Wasshuber
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Yingsheng Tung; Wade James Brady, III; Frederick J. Telecky, Jr.
- Main IPC: H01L29/8238
- IPC: H01L29/8238 ; H01L29/336 ; H01L29/3205

Abstract:
The present invention provides a single-electron transistor device (100). The device (100) comprises a source (105) and drain (110) located over a substrate (115) and a quantum island (120) situated between the source and drain (105, 110), to form tunnel junctions (125, 130) between the source and drain (105, 110). The device (100) further includes a movable electrode (135) located adjacent the quantum island (120) and a displaceable dielectric (140) located between the moveable electrode (135) and the quantum island (120). The present invention also includes a method of fabricating a single-electron device (200), and a transistor circuit (300) that include a single-electron device (310).
Public/Granted literature
- US20050153484A1 Suspended gate single-electron device Public/Granted day:2005-07-14
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