Invention Grant
US06906779B2 Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
失效
通过在衬底幅材上同步的光刻曝光来卷对卷制造显示器的方法
- Patent Title: Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
- Patent Title (中): 通过在衬底幅材上同步的光刻曝光来卷对卷制造显示器的方法
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Application No.: US10366813Application Date: 2003-02-13
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Publication No.: US06906779B2Publication Date: 2005-06-14
- Inventor: Mary Chan-Park , Xianhai Chen , Zarng-Arh George Wu , Xiaojia Wang , Hong-Mei Zang , Rong-Chang Liang
- Applicant: Mary Chan-Park , Xianhai Chen , Zarng-Arh George Wu , Xiaojia Wang , Hong-Mei Zang , Rong-Chang Liang
- Applicant Address: US CA Fremont
- Assignee: SiPix Imaging, Inc.
- Current Assignee: SiPix Imaging, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Howrey Simon Arnold & White, LLP
- Main IPC: G03F7/22
- IPC: G03F7/22 ; G02F1/1333 ; G02F1/167 ; G03F7/00 ; G03F7/20 ; G03F7/23 ; G03F7/24 ; G03B27/48 ; G03B27/54 ; G03B27/62

Abstract:
This invention relates to an electrophoretic display or a liquid crystal display and novel processes for its manufacture. The electrophoretic display (EPD) of the present invention comprises microcups of well-defined shape, size and aspect ratio and the microcups are filled with charged pigment particles dispersed in an optically contrasting dielectric solvent. The liquid crystal display (LCD) of this invention comprises well-defined microcups filled with at least a liquid crystal composition having its ordinary refractive index matched to that of the isotropic cup material. A novel roll-to-roll process and apparatus of the invention permits the display manufacture to be carried out continuously by a synchronized photo-lithographic process. The synchronized roll-to-roll process and apparatus permits a pre-patterned photomask, formed as a continuous loop, to be rolled in a synchronized motion in close parallel alignment to a web which has been pre-coated with a radiation sensitive material, so as to maintain image alignment during exposure to a radiation source. The radiation sensitive material may be a radiation curable material, in which the exposed and cured portions form the microcup structure. In an additional process step, the radiation sensitive material may be a positively working photoresist which temporarily seals the microcups. Exposure of a selected subset of the microcups via the photomask image permits selective re-opening, filling and sealing of the microcup subset. Repetition with additional colors permits the continuous assembly of a multicolor EPD or LCD display.
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