Invention Grant
- Patent Title: Optical sensor by using tunneling diode
- Patent Title (中): 光传感器采用隧道二极管
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Application No.: US10437147Application Date: 2003-05-13
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Publication No.: US06693317B2Publication Date: 2004-02-17
- Inventor: Ho-Yin Yiu , Chein-Ling Jan , Jen-Pan Wang , Lin-June Wu
- Applicant: Ho-Yin Yiu , Chein-Ling Jan , Jen-Pan Wang , Lin-June Wu
- Main IPC: H01L2976
- IPC: H01L2976

Abstract:
A method of fabricating a tunneling photodiode is presented comprised of the following steps: forming a p-well in an n-type substrate, forming a thin insulating layer over the surface of the p-type material, and then forming a thin n-type layer over the insulating layer. Preferably, the n and p type semiconductor material could be silicon and the insulating layer could be between about 30 to 40 angstroms of gate quality silicon dioxide. In other embodiments of the invention the materials of either electrode are either n or p-type semiconductors or metals.
Public/Granted literature
- US20030203525A1 Novel optical sensor by using tunneling diode Public/Granted day:2003-10-30
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