Invention Grant
- Patent Title: Flash electrically erasable and programmable ROM
- Patent Title (中): 闪存电可擦除和可编程ROM
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Application No.: US835357Application Date: 1992-02-14
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Publication No.: US5309402APublication Date: 1994-05-03
- Inventor: Takeshi Okazawa
- Applicant: Takeshi Okazawa
- Applicant Address: JPX Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JPX Tokyo
- Priority: JPX3-021885 19910215
- Main IPC: G11C16/16
- IPC: G11C16/16 ; H01L21/8247 ; H01L27/115 ; G11C11/40
Abstract:
A flash EEPROM with sector erasure, carries out the erasure by applying a negative voltage to a selected word line through an N-channel MOS transistor. P-channel MOS transistors are respectively inserted between row decoder level shifters and each of their respective word lines to which they are respectively connected. The turning-on and -off of the respective word lines and first level shifters is controlled by the turning-on and -off of the associated P-channel MOS transistor. An erase voltage is applied to one end of the source/drain path of the respective N-channel MOS transistor of the selected cord line, the other end to the respective word lines. The turning-on and -off of the N-channel MOS transistor is synchronized with the turning-on and -off of the P-channel MOS transistor connected to the same word line. The P-channel MOS transistor is formed on an N well biased to, for example, 5 V and the N-channel MOS transistor is formed on a P well biased to, for example, the erase voltage. The P well is formed on the surface of the N well.
Public/Granted literature
- US4784811A Method of constructing improved pressure-sensitive optrode Public/Granted day:1988-11-15
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