发明授权
- 专利标题: Apparatus and method for the horizontal, crucible-free growth of silicon sheet crystals
- 专利标题(中): 硅片晶体水平,无坩埚生长的装置和方法
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申请号: US649627申请日: 1984-09-12
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公开(公告)号: US4650541A公开(公告)日: 1987-03-17
- 发明人: Theodore F. Ciszek
- 申请人: Theodore F. Ciszek
- 申请人地址: DC Washington
- 专利权人: The United States of America as represented by the United States Department of Energy
- 当前专利权人: The United States of America as represented by the United States Department of Energy
- 当前专利权人地址: DC Washington
- 主分类号: C30B15/06
- IPC分类号: C30B15/06 ; C30B29/06 ; C30B29/64
摘要:
Apparatus for continuously forming a silicon crystal sheet from a silicon rod in a noncrucible environment. The rod is rotated and fed toward an RF coil in an inert atmosphere so that the upper end of the rod becomes molten and the silicon sheet crystal is pulled therefrom substantially horizontally in a continuous strip. A shorting ring may be provided around the rod to limit the heating to the upper end only. Argon gas can be used to create the inert atmosphere within a suitable closed chamber. By use of this apparatus and method, a substantially defect-free silicon crystal sheet is formed that can be used for microcircuitry chips or solar cells.
公开/授权文献
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