Invention Grant
- Patent Title: High beta, high frequency transistor structure
- Patent Title (中): 高β,高频晶体管结构
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Application No.: US858572Application Date: 1977-12-08
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Publication No.: US4151540APublication Date: 1979-04-24
- Inventor: Wendell B. Sander , William H. Shepherd
- Applicant: Wendell B. Sander , William H. Shepherd
- Applicant Address: CA Mountain View
- Assignee: Fairchild Camera and Instrument Corporation
- Current Assignee: Fairchild Camera and Instrument Corporation
- Current Assignee Address: CA Mountain View
- Main IPC: H01L21/265
- IPC: H01L21/265 ; H01L29/06 ; H01L29/10 ; H01L29/72
Abstract:
High beta, high frequency transistors require very narrow and high resistance base structures, thereby placing a low limit of collector-emitter voltages that may be used without encountering "punch-through" breakdown. This invention permits the use of normal collector-emitter voltages without danger of punch-through problems by injecting into the high resistance base material an impurity grid that serves both as an electrostatic shield to increase the voltage breakdown level, and as a means of reducing the apparent lateral base resistance, thereby further increasing the high frequency capability of the device without degrading the high beta characteristics.
Public/Granted literature
- US5882143A Low head dam hydroelectric system Public/Granted day:1999-03-16
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