Invention Application
- Patent Title: RADIO FREQUENCY FRONT-END STRUCTURES
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Application No.: US18944243Application Date: 2024-11-12
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Publication No.: US20250071885A1Publication Date: 2025-02-27
- Inventor: Sidharth Dalmia , Zhenguo Jiang , William J. Lambert , Kirthika Nahalingam , Swathi Vijayakumar
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Main IPC: H05K1/02
- IPC: H05K1/02 ; G06F1/16 ; H01F5/04 ; H01L25/16 ; H04B1/40 ; H05K1/18

Abstract:
Disclosed herein are radio frequency (RF) front-end structures, as well as related methods and devices. In some embodiments, an RF front-end package may include an RF package substrate including an embedded passive circuit element. At least a portion of the embedded passive circuit element may be included in a metal layer of the RF package substrate. The RF package substrate may also include a ground plane in the metal layer.
Information query