发明公开
US20240339769A1 TERMINAL
审中-公开
- 专利标题: TERMINAL
-
申请号: US18368200申请日: 2023-09-14
-
公开(公告)号: US20240339769A1公开(公告)日: 2024-10-10
- 发明人: Shigenobu SEKINE
- 申请人: Napra Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Napra Co., Ltd.
- 当前专利权人: Napra Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP 23063460 2023.04.10
- 主分类号: H01R4/58
- IPC分类号: H01R4/58 ; H01B1/02 ; H01R13/03
摘要:
According to this invention, provided is a terminal having a plating layer formed on a surface of a base, the plating layer having a structure in which an intermetallic compound crystal that contains Sn, Cu, Cr and Ni, is dispersed in a parent phase that contains Sn and an Sn—Cu alloy.
公开/授权文献
- US12113321B1 Terminal 公开/授权日:2024-10-08
信息查询