- 专利标题： FLUORESCENCE MODE FOR WORKPIECE INSPECTION
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申请号： US18611299申请日： 2024-03-20
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公开(公告)号： US20240319096A1公开(公告)日： 2024-09-26
- 发明人: Grace H. Chen , Xuezhen Wang , Junjun Shan , Pradeepkumar Jagadesan
- 申请人： KLA Corporation
- 申请人地址： US CA Milpitas
- 专利权人： KLA Corporation
- 当前专利权人： KLA Corporation
- 当前专利权人地址： US CA Milpitas
- 主分类号： G01N21/64
- IPC分类号： G01N21/64 ; G01N21/88 ; G01N21/95
摘要：
A beam of light is directed at a workpiece that includes a low-k dielectric material, which causes fluorescence emission from the low-k dielectric material. The workpiece is imaged during fluorescence emission. The imaging can use an optical filter in an imaging path of the beam of light that selects at least one wavelength from 300 nm to 900 nm.
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