- 专利标题: METHOD FOR FORMING SEMICONDUCTOR PACKAGE STRUCTURE
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申请号: US18631181申请日: 2024-04-10
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公开(公告)号: US20240258193A1公开(公告)日: 2024-08-01
- 发明人: Po-Chen LAI , Ming-Chih YEW , Po-Yao LIN , Chin-Hua WANG , Shin-Puu JENG
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 分案原申请号: US17527831 2021.11.16
- 主分类号: H01L23/367
- IPC分类号: H01L23/367 ; H01L21/48 ; H01L23/00 ; H01L23/42 ; H01L23/433 ; H01L23/498 ; H01L25/065
摘要:
A method of forming a semiconductor package structure is provided. The method includes disposing a first semiconductor device on an interposer substrate, disposing the interposer substrate on a carrier substrate, applying a thermal interface material on the first semiconductor device, and attaching a lid on the carrier substrate to cover the first semiconductor device. The interposer substrate is disposed between the carrier substrate and the first semiconductor device. The lid includes a lower surface having a first recess facing the first semiconductor device, and a portion of the thermal interface material is accommodated in the first recess.
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