Invention Publication
- Patent Title: INTEGRATED CIRCUIT SEMICONDUCTOR DEVICE
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Application No.: US18224802Application Date: 2023-07-21
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Publication No.: US20240032280A1Publication Date: 2024-01-25
- Inventor: Taejin PARK , Kyujin KIM , Bongsoo KIM , Huijung KIM , Chulkwon PARK , Gyunghyun YOON , Heejae CHAE
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTEONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTEONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20220091319 2022.07.22
- Main IPC: H10B12/00
- IPC: H10B12/00

Abstract:
An Integrated Circuit (IC) semiconductor device includes: field insulating layers buried in field trenches disposed apart from each other inside a substrate; active regions defined by the field insulating layers; and active fins disposed on the active regions and protruding from surfaces of the field insulating layers. The field insulating layers include a first subfield insulating layer and a second subfield insulating layer, and a surface of the first subfield insulating layer is disposed at a level lower than a level of a surface of the second subfield insulating layer.
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