- 专利标题: SELF-HEALING POLISHING PAD
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申请号: US18066934申请日: 2022-12-15
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公开(公告)号: US20230118617A1公开(公告)日: 2023-04-20
- 发明人: Chun-Hao Kung , Hui-Chi Huang , Kei-Wei Chen , Yen-Ting Chen
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H01L21/306
- IPC分类号: H01L21/306 ; B24B37/24 ; H01L21/321
摘要:
Provided herein are polishing pads in which microcapsules that include a polymer material and are dispersed, as well as methods of making and using the same. Such microcapsules are configured to break open (e.g., when the polishing pad is damaged during the dressing process), which releases the polymer material. When contacted with ultraviolet light the polymer material at least partially cures, healing the damage to the polishing pad. Such polishing pads have a longer lifetime and a more stable remove rate when compared to standard polishing pads.
公开/授权文献
- US12087590B2 Self-healing polishing pad 公开/授权日:2024-09-10
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