Invention Application
- Patent Title: ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
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Application No.: US17948838Application Date: 2022-09-20
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Publication No.: US20230075188A1Publication Date: 2023-03-09
- Inventor: Taro MIYOSHI , Eiji FUKUZAKI
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2020-065191 20200331
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/004 ; G03F7/038 ; C08F212/14 ; C08F220/28 ; C08F220/30 ; C07C381/12 ; C07C309/04 ; C07D307/00 ; C07D309/30 ; C07D327/06 ; C07D333/46 ; C07D335/02 ; C07D333/76 ; C07C43/225 ; C07C25/18

Abstract:
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.
Information query
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