发明公开
- 专利标题: SEMICONDUCTOR DEVICE
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申请号: US18300180申请日: 2023-04-13
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公开(公告)号: US20230337414A1公开(公告)日: 2023-10-19
- 发明人: Jungmin PARK , Hanjin LIM , Hyungsuk JUNG
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR 20220046499 2022.04.14
- 主分类号: H10B12/00
- IPC分类号: H10B12/00
摘要:
A semiconductor device includes a cell capacitor disposed on a substrate and that and includes a first electrode, a dielectric layer structure, and a second electrode. The dielectric layer structure includes a first dielectric layer disposed on the first electrode and that includes a ferroelectric material, a second dielectric layer disposed on the first dielectric layer and that includes an antiferroelectric material, and dielectric particles dispersed in at least one of the first dielectric layer or the second dielectric layer and that include a paraelectric material.
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