Invention Publication
- Patent Title: SEMICONDUCTOR DEVICE AND SEMICONDUCTOR APPARATUS INCLUDING THE SEMICONDUCTOR DEVICE
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Application No.: US17986237Application Date: 2022-11-14
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Publication No.: US20230155026A1Publication Date: 2023-05-18
- Inventor: Hagyoul BAE , Dukhyun CHOE , Jinseong HEO , Yunseong LEE , Seunggeol NAM , Hyunjae LEE
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20210158042 2021.11.16
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/108 ; H01L27/24 ; H01L29/51 ; H01L29/66

Abstract:
Provided are a semiconductor device and a semiconductor apparatus including the semiconductor device. The semiconductor device includes a substrate having a channel layer comprising a dopant, a ferroelectric layer on the channel layer; and a gate on the ferroelectric layer. The channel layer has a doping concentration of 1×1015 cm−3 to 1×1021 cm−3.
Public/Granted literature
- US2225206A Speed control Public/Granted day:1940-12-17
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