Invention Application
- Patent Title: METHOD AND APPARATUS FOR CONTROLLING A COMPUTING PROCESS
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Application No.: US17751110Application Date: 2022-05-23
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Publication No.: US20220283511A1Publication Date: 2022-09-08
- Inventor: Yen-Wen LU , Xiaorui CHEN , Yang LIN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G05B19/418

Abstract:
A method of controlling a computer process for designing or verifying a photolithographic component, the method including building a source tree including nodes of the process, including dependency relationships among the nodes, defining, for some nodes, at least two different process conditions, expanding the source tree to form an expanded tree, including generating a separate node for each different defined process condition, and duplicating dependent nodes having an input relationship to each generated separate node, determining respective computing hardware requirements for processing the node, selecting computer hardware constraints based on capabilities of the host computing system, determining, based on the requirements and constraints and on dependency relations in the expanded tree, an execution sequence for the computer process, and performing the computer process on the computing system.
Information query
IPC分类: