Invention Application
- Patent Title: METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL
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Application No.: US17600493Application Date: 2020-03-20
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Publication No.: US20220213593A1Publication Date: 2022-07-07
- Inventor: Tamara DRUZHININA , Jim Vincent OVERKAMP , Alexey Olegovich POLYAKOV , Teis Johan COENEN , Evgenia KURGANOVA , Ionel Mugurel CIOBICA , Alexander Ludwig KLEIN , Albertus Victor Gerardus MANGNUS , Marijke SCOTUZZI , Bastiaan Maurice VAN DEN BROEK
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP19168949.6 20190412,EP19178048.5 20190604,EP19215592.7 20191212
- International Application: PCT/EP2020/057781 WO 20200320
- Main IPC: C23C16/26
- IPC: C23C16/26 ; C23C16/48 ; C23C16/56 ; G03F7/20 ; G03F1/22
Abstract:
Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.
Information query
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