- 专利标题: SURFACE MODIFICATION OF SILICON PARTICLES FOR ELECTROCHEMICAL STORAGE
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申请号: US16744818申请日: 2020-01-16
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公开(公告)号: US20220085356A9公开(公告)日: 2022-03-17
- 发明人: Wei Wang , Benjamin Yong Park , Ian Russell Browne
- 申请人: Enevate Corporation
- 申请人地址: US CA Irvine
- 专利权人: Enevate Corporation
- 当前专利权人: Enevate Corporation
- 当前专利权人地址: US CA Irvine
- 主分类号: H01M4/36
- IPC分类号: H01M4/36 ; H01M4/04 ; H01M4/134 ; H01M4/1395 ; H01M4/38 ; H01M4/587 ; H01M4/62 ; H01B1/04 ; C01B32/90 ; H01M4/48 ; H01M4/583 ; H01M10/0525
摘要:
Silicon particles for active materials and electro-chemical cells are provided. The active materials comprising silicon particles described herein can be utilized as an electrode material for a battery. In certain embodiments, the composite material includes greater than 0% and less than about 90% by weight silicon particles, the silicon particles having an average particle size between about 10 nm and about 40 μm, wherein the silicon particles have surface coatings comprising silicon carbide or a mixture of carbon and silicon carbide, and greater than 0% and less than about 90% by weight of one or more types of carbon phases, wherein at least one of the one or more types of carbon phases is a substantially continuous phase.
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