- 专利标题: GAS ANALYSIS DEVICE
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申请号: US17245703申请日: 2021-04-30
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公开(公告)号: US20220057319A1公开(公告)日: 2022-02-24
- 发明人: Shinji SAITO , Tsutomu KAKUNO , Rei HASHIMOTO , Kei KANEKO
- 申请人: KABUSHIKI KAISHA TOSHIBA
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2020-138661 20200819
- 主分类号: G01N21/03
- IPC分类号: G01N21/03 ; G01N21/39 ; G01N21/27
摘要:
According to one embodiment, a gas analysis device includes: a base including a concave portion; a window includes a first film and a second film; an optical part that is located at a side of the window opposite to the base side and includes a light projector and a light receiver; and an optical path length controller that is located between the base and the window and has a controllable thickness. The concave portion includes a first sidewall that is oblique to a surface of the base, and a second sidewall that is oblique to the surface of the base. An oblique direction of the second sidewall is opposite to an oblique direction of the first sidewall. The light projector is configured to irradiate light toward the first sidewall. The light receiver is configured to convert light reflected by the second sidewall.
公开/授权文献
- US11435282B2 Gas analysis device 公开/授权日:2022-09-06
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