Invention Application
- Patent Title: MULTI-BEAM INSPECTION APPARATUS WITH IMPROVED DETECTION PERFORMANCE OF SIGNAL ELECTRONS
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Application No.: US17146409Application Date: 2021-01-11
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Publication No.: US20210151291A1Publication Date: 2021-05-20
- Inventor: Weiming REN , Xuedong LIU , Xuerang HU , Zhong-wei CHEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/147 ; H01J37/30 ; H01J37/28 ; B82Y10/00 ; B82Y40/00

Abstract:
The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.
Public/Granted literature
- US11282675B2 Multi-beam inspection apparatus with improved detection performance of signal electrons Public/Granted day:2022-03-22
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