Invention Application
- Patent Title: DIELECTRIC, CAPACITOR INCLUDING DIELECTRIC, SEMICONDUCTOR DEVICE INCLUDING DIELECTRIC, AND METHOD OF MANUFACTURING DIELECTRIC
-
Application No.: US16853195Application Date: 2020-04-20
-
Publication No.: US20210118980A1Publication Date: 2021-04-22
- Inventor: Hyeoncheol PARK , Chan KWAK , Euncheol DO , Giyoung JO
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2019-0130812 20191021
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01G4/12 ; H01G4/30 ; H01G4/012 ; H01L27/108 ; C01G35/00

Abstract:
Provided are a dielectric including an oxide represented by Formula 1 below and having a cubic crystal structure, a capacitor including the dielectric, a semiconductor device including the dielectric, and a method of manufacturing the dielectric. (RbxA1-x)(ByTa1-y)O3-δ In Formula 1 above, A is K, Na, Li, Cs, or a combination thereof, B is Nb, V, or a combination thereof, and 0.1≤x≤0.2, 0≤y≤0.2, and 0≤δ≤0.5 are satisfied.
Public/Granted literature
Information query
IPC分类: