Invention Application
- Patent Title: METHODS OF DETERMINING STRESS IN A SUBSTRATE, CONTROL SYSTEM FOR CONTROLLING A LITHOGRAPHIC PROCESS, LITHOGRAPHIC APPARATUS AND COMPUTER PROGRAM PRODUCT
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Application No.: US16485499Application Date: 2018-02-07
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Publication No.: US20200050117A1Publication Date: 2020-02-13
- Inventor: Richard Johannes Franciscus VAN HAREN , Leon Paul VAN DIJK , Ilya MALAKHOVSKY , Ronald Henricus Johannes OTTEN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven The Netherland
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven The Netherland
- Priority: EP17160800.3 20170314
- International Application: PCT/EP2018/053013 WO 20180207
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A method and control system for determining stress in a substrate. The method includes determining a measured position difference between a measured position of at least one first feature and a measured position of at least one second feature which have been applied on a substrate, and determining local stress in the substrate from the measured position difference.
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