发明申请
- 专利标题: Semiconductor Device and Method of Forming Double-Sided Fan-Out Wafer Level Package
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申请号: US16570049申请日: 2019-09-13
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公开(公告)号: US20200006215A1公开(公告)日: 2020-01-02
- 发明人: Il Kwon Shim , Pandi C. Marimuthu , Won Kyoung Choi , Sze Ping Goh , Jose A. Caparas
- 申请人: STATS ChipPAC Pte. Ltd.
- 申请人地址: SG Singapore
- 专利权人: STATS ChipPAC Pte. Ltd.
- 当前专利权人: STATS ChipPAC Pte. Ltd.
- 当前专利权人地址: SG Singapore
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L21/56 ; H01L23/31
摘要:
A semiconductor device comprises a first semiconductor package including a conductive layer. A substrate including an interconnect structure is disposed over the conductive layer. The interconnect structure of the substrate with the conductive layer of the first semiconductor package are self-aligned. A plurality of openings is formed in the substrate. An adhesive is disposed between the substrate and the first semiconductor package and in the openings of the substrate. A redistribution layer (RDL) is formed over the first semiconductor package opposite the substrate. A pitch of the substrate is different from a pitch of the RDL. The adhesive extends to the interconnect structure of the substrate. A second semiconductor package is disposed over the substrate and the first semiconductor package.
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