- 专利标题: MASK STRUCTURE AND MANUFACTURING METHOD THEREOF
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申请号: US16395244申请日: 2019-04-26
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公开(公告)号: US20190250502A1公开(公告)日: 2019-08-15
- 发明人: Pu-Ju Lin , Shih-Lian Cheng , Yu-Hua Chen , Cheng-Ta Ko , Jui-Jung Chien , Wei-Tse Ho
- 申请人: Unimicron Technology Corp.
- 申请人地址: TW Taoyuan City
- 专利权人: Unimicron Technology Corp.
- 当前专利权人: Unimicron Technology Corp.
- 当前专利权人地址: TW Taoyuan City
- 主分类号: G03F1/50
- IPC分类号: G03F1/50 ; G03F7/20 ; H05K3/42 ; H05K3/18 ; H05K3/12 ; H05K3/10 ; H05K3/00 ; G01K15/00 ; G01K7/24 ; H05K3/24 ; H05K3/06
摘要:
A mask structure and a manufacturing method of the mask structure are provided. The mask structure includes a transparent substrate, a patterned metal layer, and a plurality of microlens structures. The patterned metal layer is disposed on the transparent substrate and exposing a portion of the transparent substrate. The microlens structures are disposed on the transparent substrate exposed by a portion of the patterned metal layer and being in contact with the portion of the patterned metal layer.
公开/授权文献
- US11366381B2 Mask structure and manufacturing method thereof 公开/授权日:2022-06-21
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