Invention Application
- Patent Title: TRANSISTOR HAVING LOW CAPACITANCE FIELD PLATE STRUCTURE
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Application No.: US15791771Application Date: 2017-10-24
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Publication No.: US20190123150A1Publication Date: 2019-04-25
- Inventor: Christopher J. MacDonald , Kenneth A. Wilson , Kamal Tabatabaie Alavi , Adrian D. Williams
- Applicant: Raytheon Company
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/20 ; H01L29/205 ; H01L29/778 ; H01L29/66 ; H01L21/311

Abstract:
A Field Effect Transistor (FET) having a source, drain, and gate disposed laterally along a surface of a semiconductor and a field plate structure: having one end connected to the source; and having a second end disposed between the gate and the drain and separated from the drain by a gap. A dielectric structure is disposed over the semiconductor, having: a first portion disposed under the second end of the field plate structure; and, a second, thinner portion under the gap.
Public/Granted literature
- US10720497B2 Transistor having low capacitance field plate structure Public/Granted day:2020-07-21
Information query
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