Invention Application
- Patent Title: LITHOGRAPHIC METHOD
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Application No.: US16132520Application Date: 2018-09-17
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Publication No.: US20190094721A1Publication Date: 2019-03-28
- Inventor: Patricius Aloysius Jacobus TINNEMANS , Edo Maria HULSEBOS , Henricus Johannes Lambertus MEGENS , Sudharshanan RAGHUNATHAN , Boris MENCHTCHIKOV , Ahmet Koray ERDAMAR , Loek Johannes Petrus VERHEES , Willem Seine Christian ROELOFS , Wendy Johanna Martina VAN DE VEN , Hadi YAGUBIZADE , Hakki Ergün CEKLI , Ralph BRINKHOF , Tran Thanh Thuy VU , Maikel Robert GOOSEN , Maaike VAN'T WESTEINDE , Weitian KOU , Manouk RIJPSTRA , Matthijs COX , Franciscus Godefridus Casper BIJNEN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP17193637 20170928; EP18164511 20180328; EP18166720 20180411
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20
Abstract:
A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.
Public/Granted literature
- US10527958B2 Lithographic method Public/Granted day:2020-01-07
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