Invention Application
- Patent Title: COMPOUND LATERAL RESISTOR STRUCTURES FOR INTEGRATED CIRCUITRY
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Application No.: US15748608Application Date: 2015-08-26
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Publication No.: US20190006279A1Publication Date: 2019-01-03
- Inventor: Chen-Guan Lee , Vadym Kapinus , Pei-Chi Liu , Joodong Park , Walid M. Hafez , Chia-Hong Jan
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- International Application: PCT/US2015/046858 WO 20150826
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L27/06 ; H01L49/02 ; H01L29/78 ; H01L21/86 ; H01L29/786

Abstract:
IC device structures including a lateral compound resistor disposed over a surface of a substrate, and fabrication techniques to form such a resistor in conjunction with fabrication of a transistor. Rather than being stacked vertically, a compound resistive trace may include a plurality of resistive materials arranged laterally over a substrate. Along a resistive trace length, a first resistive material is in contact with a sidewall of a second resistive material. A portion of a first resistive material along a centerline of the resistive trace may be replaced with a second resistive material so that the second resistive material is embedded within the first resistive material.
Public/Granted literature
- US10340220B2 Compound lateral resistor structures for integrated circuitry Public/Granted day:2019-07-02
Information query
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