Invention Application
- Patent Title: APPARATUS AND METHOD FOR INFERRING PARAMETERS OF A MODEL OF A MEASUREMENT STRUCTURE FOR A PATTERNING PROCESS
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Application No.: US15900735Application Date: 2018-02-20
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Publication No.: US20180239851A1Publication Date: 2018-08-23
- Inventor: Alexander YPMA , Maurits VAN DER SCHAAR , Georgios TSIROGIANNIS , Leendert Jan KARSSEMEIJER , Chi-Hsiang FAN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06N7/00

Abstract:
A process of calibrating parameters of a stack model used to simulate the performance of measurement structures in a patterning process, the process including: obtaining a stack model used in a simulation of performance of measurement structures; obtaining calibration data indicative of performance of the measurement structures; calibrating parameters of the model by, until a termination condition occurs, repeatedly: simulating performance of the measurement structures with the simulation using a candidate model; approximating the simulation, based on a result of the simulation, with a surrogate function; and selecting a new candidate model based on the approximation.
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