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公开(公告)号：US20230017491A1
公开(公告)日：2023-01-19
申请号：US17784566
申请日：2020-12-03
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Igor Matheus Petronalla AARTS , Kaustuve BHATTACHARYYA , Ralph BRINKHOF , Leendert Jan KARSSEMEIJER , Stefan Carolus Jacobus A KEIJ , Haico Victor KOK , Simon Gijsbert Josephus MATHIJSSEN , Henricus Johannes Lambertu MEGENS , Samee Ur REHMAN
Abstract: A metrology method relating to measurement of a structure on a substrate, the structure being subject to one or more asymmetric deviation. The method includes obtaining at least one intensity asymmetry value relating to the one or more asymmetric deviations, wherein the at least one intensity asymmetry value includes a metric related to a difference or imbalance between the respective intensities or amplitudes of at least two diffraction orders of radiation diffracted by the structure; determining at least one phase offset value corresponding to the one or more asymmetric deviations based on the at least one intensity asymmetry value; and determining one or more measurement corrections for the one or more asymmetric deviations from the at least one phase offset value.
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Patent Agency Ranking
公开(公告)号：US20240210844A1
公开(公告)日：2024-06-27
申请号：US18596499
申请日：2024-03-05
Applicant: ASML Netherlands B.V.
CPC classification number: G03F9/7092 , G03F7/70508 , G03F9/7046 , G03F9/7088
Abstract: Disclosed is a method of determining a substrate deformation metric relating to at least one substrate, the substrate deformation metric describing deformation across the at least one substrate. The method comprises obtaining alignment data relating to measurement of a plurality of structures on said substrate using a plurality of illumination conditions; and determining substrate deformation metric values for the substrate deformation metric which minimizes the number of basis vectors which are required to expand dispersion due to structure deformation of said plurality of structures.
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公开(公告)号：US20240012342A1
公开(公告)日：2024-01-11
申请号：US18035008
申请日：2021-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus GOORDEN , Simon Gijsbert Josephus MATHIJSSEN , Leendert Jan KARSSEMEIJER , Manouk RIJPSTRA , Ralph BRINKHOF , Kaustuve BHATTACHARYYA
CPC classification number: G03F9/7046 , G03F7/706831 , G03F7/70625 , G03F7/706837
Abstract: A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.
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4.发明申请公开(公告)号：US20180239851A1
公开(公告)日：2018-08-23
申请号：US15900735
申请日：2018-02-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Alexander YPMA , Maurits VAN DER SCHAAR , Georgios TSIROGIANNIS , Leendert Jan KARSSEMEIJER , Chi-Hsiang FAN
CPC classification number: G06F17/5009 , G03F7/70516 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F9/7019 , G06N7/005
Abstract: A process of calibrating parameters of a stack model used to simulate the performance of measurement structures in a patterning process, the process including: obtaining a stack model used in a simulation of performance of measurement structures; obtaining calibration data indicative of performance of the measurement structures; calibrating parameters of the model by, until a termination condition occurs, repeatedly: simulating performance of the measurement structures with the simulation using a candidate model; approximating the simulation, based on a result of the simulation, with a surrogate function; and selecting a new candidate model based on the approximation.
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公开(公告)号：US20240168397A1
公开(公告)日：2024-05-23
申请号：US18552623
申请日：2022-03-21
Applicant: ASML Netherlands B.V.
Inventor： Joshua ADAMS , Leonardo Gabriel MONTILLA , Nick Franciscus Wilhelmus THISSEN , Leendert Jan KARSSEMEIJER , Igor Matheus Petronella AARTS , Zahrasadat DASTOURI
IPC: G03F9/00 , G01B9/02055 , G01B11/16 , G01B11/27 , G03F7/00
CPC classification number: G03F9/7049 , G01B9/02062 , G01B11/161 , G01B11/272 , G03F7/70616 , G03F7/706841 , G03F9/7065 , G03F9/7088 , G03F9/7092
Abstract: Systems, apparatuses, and methods are provided for correcting the detected positions of alignment marks disposed on a substrate and aligning the substrate using the corrected data to ensure accurate exposure of one or more patterns on the substrate. An example method can include receiving measurement data indicative of an interference between light diffracted from a plurality of alignment marks disposed on a substrate or reflected from the substrate. The example method can further include determining substrate deformation data based on the measurement data. The example method can further include determining alignment mark deformation data based on the measurement data. The alignment mark deformation data can include alignment mark deformation spectral pattern data, alignment mark deformation amplitude data, and alignment mark deformation offset data. Subsequently, the example method can include determining a correction to the measurement data based on the substrate deformation data and the alignment mark deformation data.
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公开(公告)号：US20240118631A1
公开(公告)日：2024-04-11
申请号：US18276420
申请日：2022-02-11
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F9/7046 , G03F7/70633 , G03F7/706837
Abstract: A method for determining a set of correction weights to correct metrology data. The method includes obtaining first metrology data relating to a plurality of illumination settings of measurement radiation used to perform a measurement, where each illumination setting includes a different wavelength, polarization or combination thereof; fitting the metrology data to a model for representing the metrology data and determining fit residuals; and determining the correction weights as correction weights which minimize the fit residuals.
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