- 专利标题: POWER SEMICONDUCTOR DEVICE AND METHOD THEREFOR
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申请号: US15896847申请日: 2018-02-14
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公开(公告)号: US20180175142A1公开(公告)日: 2018-06-21
- 发明人: Shinya SONEDA
- 申请人: Mitsubishi Electric Corporation
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Electric Corporation
- 当前专利权人: Mitsubishi Electric Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2016-220330 20161111
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L27/06 ; H01L29/739 ; H01L21/263
摘要:
An RC-IGBT according to the invention includes a high electric field cell formed in a region surrounded by an IGBT cell or in a region surrounded by a diode cell, and an n+ diffusion layer formed at a position opposed to the high electric field cell, the position being on a second main surface of an n− type drift layer. The high electric field cell has a higher maximum electric field intensity generated when a voltage is applied between main terminals than maximum electric field intensities of the IGBT cell, the diode cell, and a withstand voltage holding structure. Additionally, a p+ type collector layer and the high electric field cell fail to overlap with each other in a direction vertical to a first main surface of the n− type drift layer in a plane view.
公开/授权文献
- US10186571B2 Power semiconductor device and method therefor 公开/授权日:2019-01-22
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