- 专利标题: LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
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申请号: US15671325申请日: 2017-08-08
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公开(公告)号: US20180047592A1公开(公告)日: 2018-02-15
- 发明人: Masahiro Fukuda , Hiroshi Ichinomiya , Koichi Obata , Taro Yamamoto , Kouichirou Tanaka
- 申请人: Tokyo Electron Limited
- 优先权: JP2016-157997 20160810
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; B05C11/08 ; G03F7/16 ; B05C11/10 ; B08B3/08 ; B08B3/10 ; H01L21/027 ; B05C5/02
摘要:
There is provided a guide member 3 in which an inclined surface 32 thereof is inclined downwardly outwards from an edge portion of a rear surface of a horizontally held wafer W; and a cylindrical surrounding member 2 which surrounds the wafer W and in which an upper peripheral portion thereof is inwardly extended obliquely upwards. Further, the surrounding member 2 has, at an inner surface side thereof, two groove portions 23 extended along an entire circumference and located above a height position of the horizontally held wafer W. If an air flow flows along the surrounding member 2, a vortex flow is formed within the groove portions 23 and stays therein. Thus, mist can be captured, so that the flow of the mist to the outside of a cup body 1 can be suppressed. Accordingly, the adhesion of the mist to the wafer W can be suppressed.
公开/授权文献
- US10128136B2 Liquid processing apparatus and liquid processing method 公开/授权日:2018-11-13
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